Tuo Wang (王拓) was born in 1983 in Tianjin. He received his BS (2006) from Tianjin University and PhD (2010) from the University of Texas at Austin, both in chemical engineering. After gaining another year of research experience as a postdoctoral associate, he joined Novellus Systems, Inc. (currently Lam Research Corp.) as a process development engineer in Tualatin, OR. Since August 2012, he has been an associate professor in chemical engineering in Tianjin University. His research included ALD of high-k dielectrics and epitaxial growth of perovskite thin films, as well as PECVD of carbon-based etching hardmasks. His current research focuses on nanostructured materials for energy conversion and storage systems.
Education
2002.09 – 2006.07, Tianjin University, School of Chemical Engineering and Technology, BS
2006.08 – 2010.08, University of Texas at Austin, Department of Chemical Engineering, PhD
Work Experience
2010.09 – 2011.05, University of Texas at Austin, Department of Chemical Engineering, Postdoc
2011.06 – 2012.06, Novellus Systems, Inc., PECVD Business Unit, Process Development Engineer
2012.08 – present, Tianjin University, School of Chemical Engineering and Technology, Associate Professor
Research Interests
(1) Thin film deposition: Atomic layer deposition (ALD) and plasma enhanced chemical vapor deposition (PECVD) of oxides, nitrides, metals, perovskites, etc.
(2) Nanostructures for energy conversion and storage: 3-D nanostructured thin films for solar water splitting photoelectrodes
(3) Electronic materials: Nanoscale thin films for microelectronic devices, including ultrathin metal layers, high-k dielectrics
Selected Awards
2017 国家自然科学基金优秀青年
2013 天津大学北洋学者–青年骨干
2010 Chinese Government Award for Outstanding Students Aboard, China Scholarship Council
2009 Graduate Student Professional Development Awards, University of Texas at Austin
Selected Publications
Most recent list: http://www.researcherid.com/rid/N-6431-2015
(8) Tuo Wang, Rui Lv, Peng Zhang, Changjiang Li, and Jinlong Gong*, “Au Nanoparticles Sensitized ZnO Nanopencil Arrays for Photoelectrochemical Water Splitting,” Nanoscale 2015, in press (Cover Story). http://dx.doi.org/10.1039/C4NR03735A
(5) Tuo Wang, John G. Ekerdt*, “Atomic Layer Deposition of Tantalum-incorporated Hafnium Dioxide: Strategies to Enhance Thermal Stability,” J. Electrochem. Soc. 2011, 158, G185-G193. http://dx.doi.org/10.1149/1.3598172
(4) Tuo Wang, Junwei Wei, Michael C. Downer, and John G. Ekerdt*, “Optical Properties of La-incorporated HfO2 upon Crystallization,” Appl. Phys. Lett. 2011, 98, 122904. http://dx.doi.org/10.1063/1.3567522
(3) Tuo Wang, John G. Ekerdt*, “Structure versus Thermal Stability: The Periodic Structure of Atomic Layer Deposition-Grown Al-Incorporated HfO2 Films and Its Effects on Amorphous Stabilization,” Chem. Mater. 2011, 23, 1679-1685. http://dx.doi.org/10.1021/cm9001064
(2) Tuo Wang, John G. Ekerdt*, “Subnanoscale Lanthanum Distribution in Lanthanum-Incorporated Hafnium Oxide Thin Films Grown Using Atomic Layer Deposition,” Chem. Mater. 2010, 22, 3798-3806. http://dx.doi.org/10.1021/cm903386c
(1) Tuo Wang, John G. Ekerdt*, “Atomic Layer Deposition of Lanthanum Stabilized Amorphous Hafnium Oxide Thin Films,” Chem. Mater. 2009, 21, 3096-3101. http://dx.doi.org/10.1021/cm9001064